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SEM is an advanced imaging instrument that employs electron beams to visualize the surface morphology of specimens with high resolution. By scanning the specimen, SEM generates detailed images, revealing micro- and nano-scale structural features crucial for scientific analysis in fields such as materials science and biology. SEM can be high-resolution imaging, elemental composition, surface analysis, material characterization, and 3D Imaging.

General Methods Description:
Samples were mounted on conductive aluminum stubs and coated with 15 nm of platinum to reduce charging. Imaging was performed using a JEOL JSM-6500F field-emission SEM at 5 kV accelerating voltage and an 18  mm working distance. Secondary electron and backscattered electron signals were collected to examine surface morphology and composition. Elemental analysis was conducted using an Oxford X-Max 50 EDS detector, with spectra and maps acquired under optimized beam conditions (20 kV, 12–15 mm WD). SEM and EDS data were processed using the manufacturer's software with standard background subtraction and peak identification.

Jeol6500
JEOL 6500 Field Emission SEM

Resources:
Specifications:
Resolution on Secondary Electron Image - 1.5 nm (at accelerating voltage 15kV)
- 5.0 nm (at accelerating voltage 1kV)
Accelerating Voltage 0.5 to 30 kV
Magnification Range 10X to 500,000X
Attachments X-EDS spectrometer and Oxford Instruments INCAEnergy+ software
  • - for electron beam-induced X-ray elemental analysis
Electron Backscatter Detector

Zeiss
Zeiss SUPRA 40

Resources:
Specifications:
Nominal Resolution 1.5 nm (at accelerating voltage 10kV)
Accelerating Voltage Max. 30kV
Magnification Range 10X to 500,000X
Attachments EDAX EBSD with OIM software

HitachiTM
Hitachi TM-1000 Table Top SEM

Specifications:
Depth of Focus 0.5mm
Resolution 30nm
Magnification Range 20-10,000X
Sample Size Up to 70mm